Guogui Deng
at Semiconductor Manufacturing International Corp
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 8 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Semiconductors, Oxides, Lithography, Optical lithography, Etching, Chemical vapor deposition, Photoresist materials, Process control, Integrated circuits, Critical dimension metrology, Stress analysis, Semiconducting wafers, Overlay metrology

Proceedings Article | 19 March 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Semiconductors, Electron beams, Metals, Inspection, Electron microscopes, Control systems, Scanning electron microscopy, Process control, Optical proximity correction, Critical dimension metrology

Proceedings Article | 31 March 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Laser sources, Safety, Image processing, Frequency modulation, Photomasks, Fermium, Semiconductor manufacturing, Critical dimension metrology, Chlorine, Semiconducting wafers

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