Guojing Zhang
Manager of Advanced Mask Technology at Intel Corp
SPIE Involvement:
Author
Publications (41)

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Reticles, Optical lithography, Scanners, Inspection, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Yield improvement

PROCEEDINGS ARTICLE | November 11, 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Deep ultraviolet, Scanners, Particles, Inspection, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Defect inspection

PROCEEDINGS ARTICLE | March 16, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Reflectivity, Surface roughness, Chromium, Atomic force microscopy, Image quality, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | September 9, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Lithography, Metrology, Cadmium, Spectroscopy, Scanning electron microscopy, Scatterometry, Photomasks, Extreme ultraviolet, Critical dimension metrology, Line edge roughness

PROCEEDINGS ARTICLE | March 23, 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Electron beam lithography, Silica, Inspection, Atomic force microscopy, Scanning electron microscopy, Precision measurement, Photomasks, Extreme ultraviolet lithography, Optical alignment, Defect inspection

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Lithography, Refractive index, Phase shifting, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Binary data, Phase shifts

Showing 5 of 41 publications
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