Guojing Zhang
Manager of Advanced Mask Technology at Intel Corp
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Author
Publications (41)

Proceedings Article | 18 March 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Reticles, Optical lithography, Scanners, Inspection, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Yield improvement

Proceedings Article | 11 November 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Deep ultraviolet, Scanners, Particles, Inspection, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Defect inspection

Proceedings Article | 16 March 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Reflectivity, Surface roughness, Chromium, Atomic force microscopy, Image quality, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 9 September 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Lithography, Metrology, Cadmium, Spectroscopy, Scanning electron microscopy, Scatterometry, Photomasks, Extreme ultraviolet, Critical dimension metrology, Line edge roughness

Proceedings Article | 23 March 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Electron beam lithography, Silica, Inspection, Atomic force microscopy, Scanning electron microscopy, Precision measurement, Photomasks, Extreme ultraviolet lithography, Optical alignment, Defect inspection

Proceedings Article | 14 October 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Lithography, Refractive index, Phase shifting, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Binary data, Phase shifts

Showing 5 of 41 publications
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