Dr. Gurdaman Khaira
Software Development Engineer at Siemens EDA
SPIE Involvement:
Publications (16)

Proceedings Article | 10 April 2024 Presentation
Shibing Wang, Yixiao Zhang, Jiechang Hou, Yuansheng Ma, Daman Khaira, Germain Fenger, Yuyang Sun, Bassem Hamieh, Boaz Alperson, Durairaj Baskaran, Md Rahman, Jerome Wandell, Youngjun Her
Proceedings Volume 12954, 129540W (2024) https://doi.org/10.1117/12.3010510
KEYWORDS: Directed self assembly, Stochastic processes, Optical lithography, Line edge roughness, Extreme ultraviolet, Atomic layer deposition, Semiconductors, Product engineering, Polymers, Personal protective equipment

SPIE Journal Paper | 19 October 2023
JM3, Vol. 22, Issue 04, 041603, (October 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.4.041603
KEYWORDS: Modeling, Data modeling, Semiconducting wafers, Optical proximity correction, Contour modeling, Metrology, Calibration, Stochastic processes, Scanning electron microscopy, Performance modeling

Proceedings Article | 26 May 2022 Presentation + Paper
Proceedings Volume 12051, 1205105 (2022) https://doi.org/10.1117/12.2614142
KEYWORDS: Stochastic processes, Line edge roughness, Calibration, Line width roughness, Extreme ultraviolet, Statistical analysis, Diffusion, Photoresist processing, Monte Carlo methods, Extreme ultraviolet lithography

Proceedings Article | 22 February 2021 Paper
Proceedings Volume 11613, 116130H (2021) https://doi.org/10.1117/12.2584771
KEYWORDS: SRAF, 3D modeling, Printing, Data modeling, 3D printing

Proceedings Article | 22 February 2021 Presentation + Paper
Proceedings Volume 11611, 1161112 (2021) https://doi.org/10.1117/12.2583837
KEYWORDS: Optical proximity correction, Electron beam lithography, 3D modeling, Inspection, Calibration, Lithography, Data modeling, Time metrology, Semiconducting wafers, Scanning electron microscopy

Showing 5 of 16 publications
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