Dr. Pulikanti Guruprasad Reddy
at Indian Institute of Technology Mandi
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 19 March 2018
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Thin films, Lithography, Electron beam lithography, Optical lithography, Electrons, Ions, Monte Carlo methods, Line width roughness, Helium, Line edge roughness

Proceedings Article | 19 March 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Thin films, Lithography, Electron beam lithography, Atomic force microscopy, Line width roughness, Extreme ultraviolet lithography, Line edge roughness, Photoresist developing, Resolution enhancement technologies, Tin

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