Dr. Guy Cohen
at KLA Israel
SPIE Involvement:
Publications (6)

Proceedings Article | 18 April 2013 Paper
Dana Klein, Eran Amit, Guy Cohen, Nuriel Amir, Michael Har-Zvi, Chin-Chou Kevin Huang, Ramkumar Karur-Shanmugam, Bill Pierson, Cindy Kato, Hiroyuki Kurita
Proceedings Volume 8681, 86811J (2013) https://doi.org/10.1117/12.2011454
KEYWORDS: Target detection, Semiconducting wafers, Overlay metrology, Yield improvement, Metrology, Calibration, Error analysis, Semiconductors, Manufacturing, Lithography

Proceedings Article | 18 April 2013 Paper
Proceedings Volume 8681, 86811G (2013) https://doi.org/10.1117/12.2011416
KEYWORDS: Calibration, Overlay metrology, Metrology, Semiconducting wafers, Optical filters, Neodymium, Time metrology, Process control, Ions, Data modeling

Proceedings Article | 6 April 2012 Paper
Roie Volkovich, Yosef Avrahamov, Guy Cohen, Patricia Fallon, Wenyan Yin
Proceedings Volume 8324, 832437 (2012) https://doi.org/10.1117/12.918392
KEYWORDS: Photoresist materials, Semiconducting wafers, Critical dimension metrology, Scatterometry, Semiconductors, Optical lithography, Photoresist processing, Reflectometry, Lithography, Chemistry

Proceedings Article | 5 April 2012 Paper
Proceedings Volume 8324, 832425 (2012) https://doi.org/10.1117/12.916396
KEYWORDS: Overlay metrology, Data modeling, Metrology, Process control, Manufacturing, Semiconducting wafers, Optical filters, Control systems, Lithography, Integrated circuits

Proceedings Article | 5 April 2012 Paper
Proceedings Volume 8324, 832424 (2012) https://doi.org/10.1117/12.916379
KEYWORDS: Process control, Error analysis, Metrology, Quality measurement, Overlay metrology, Precision measurement, Control systems, Scanners, Inspection, Optical lithography

Showing 5 of 6 publications
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