Dr. Guy Cohen
at KLA-Tencor Israel
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | April 18, 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Optical filters, Metrology, Data modeling, Calibration, Ions, Time metrology, Process control, Neodymium, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | April 18, 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Target detection, Semiconductors, Lithography, Metrology, Calibration, Error analysis, Manufacturing, Semiconducting wafers, Yield improvement, Overlay metrology

PROCEEDINGS ARTICLE | April 6, 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Semiconductors, Lithography, Optical lithography, Chemistry, Photoresist materials, Scatterometry, Reflectometry, Critical dimension metrology, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | April 5, 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Metrology, Optical lithography, Scanners, Error analysis, Inspection, Control systems, Quality measurement, Precision measurement, Process control, Overlay metrology

PROCEEDINGS ARTICLE | April 5, 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Lithography, Optical filters, Metrology, Data modeling, Manufacturing, Control systems, Process control, Integrated circuits, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | April 5, 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Wafer-level optics, Diffraction, Optical filters, Metrology, Computer simulations, Clouds, Quality measurement, Optical simulations, Semiconducting wafers, Overlay metrology

Showing 5 of 6 publications
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