Dr. Guy Eytan
at Applied Materials Ltd
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 5 April 2007 Paper
F. Levitov, A. Karabekov, G. Eytan, G. Golan
Proceedings Volume 6518, 65184H (2007) https://doi.org/10.1117/12.711747
KEYWORDS: Semiconducting wafers, Scanning electron microscopy, Optical filters, Electron beams, Image filtering, Electron microscopes, Process control, Sensors, Mirrors, Silicon

SPIE Journal Paper | 1 October 2006
Lior Akerman, Guy Eytan, Ryusuke Uchida, Satoshi Fujimura, Takeyoshi Mimura
JM3, Vol. 5, Issue 04, 043005, (October 2006) https://doi.org/10.1117/12.10.1117/1.2399525
KEYWORDS: Semiconducting wafers, Photoresist materials, Scanning electron microscopy, Critical dimension metrology, Chemistry, Electron microscopes, Lead, Molecules, Process control, Printing

Proceedings Article | 24 March 2006 Paper
Benjamin Bunday, John Allgair, Ofer Adan, Aviram Tam, Sergey Latinski, Guy Eytan
Proceedings Volume 6152, 61520S (2006) https://doi.org/10.1117/12.659779
KEYWORDS: Scanning electron microscopy, Metrology, Cadmium, 3D modeling, Stereoscopy, Critical dimension metrology, Transmission electron microscopy, Silicon, Algorithm development, Calibration

Proceedings Article | 10 May 2005 Paper
Lior Akerman, Guy Eytan, Ryusuke Uchida, Satoshi Fujimura, Takeyoshi Mimura
Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.599934
KEYWORDS: Semiconducting wafers, Scanning electron microscopy, Photoresist materials, Line edge roughness, Critical dimension metrology, Chemistry, Lead, Coating, Electron beam lithography, Electron microscopes

Proceedings Article | 24 May 2004 Paper
Ayelet Pnueli, Albert Karabekov, Guy Eytan
Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.556574
KEYWORDS: Image quality, Critical dimension metrology, Signal to noise ratio, Image enhancement, Process control, Semiconducting wafers, Image resolution, Spatial resolution, Metrology, Inspection

Showing 5 of 8 publications
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