Dr. Guy Eytan
at Applied Materials Ltd
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 5 April 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Semiconducting wafers, Scanning electron microscopy, Optical filters, Electron beams, Image filtering, Electron microscopes, Process control, Sensors, Mirrors, Silicon

SPIE Journal Paper | 1 October 2006
JM3 Vol. 5 Issue 04
KEYWORDS: Semiconducting wafers, Photoresist materials, Scanning electron microscopy, Critical dimension metrology, Chemistry, Electron microscopes, Lead, Molecules, Process control, Printing

Proceedings Article | 24 March 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Scanning electron microscopy, Metrology, Cadmium, 3D modeling, Stereoscopy, Critical dimension metrology, Transmission electron microscopy, Silicon, Algorithm development, Calibration

Proceedings Article | 10 May 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Semiconducting wafers, Scanning electron microscopy, Photoresist materials, Line edge roughness, Critical dimension metrology, Chemistry, Lead, Coating, Electron beam lithography, Electron microscopes

Proceedings Article | 24 May 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Image quality, Critical dimension metrology, Signal to noise ratio, Image enhancement, Process control, Semiconducting wafers, Image resolution, Spatial resolution, Metrology, Inspection

Showing 5 of 8 publications
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