Laser-induced fluorescence (LIF) of high-purity fused silica irradiated by ArF excimer laser is
studied experimentally. LIF bands of the fused silica centered at 281nm, 478nm and 650nm are
observed simultaneously. Furthermore, the angular distribution of the three fluorescence peaks is
examined. Microscopic image of the laser modified fused silica indicates that scattering of the
generated fluorescence by laser-induced damage sites is the main reason for the angular distribution
of LIF signals. Finally, the dependence of LIF signals intensities of the fused silica on laser power
densities is presented. LIF signals show a squared power density dependence, which indicates that
laser-induced defects are formed mainly via two-photon absorption processes.