Dr. Hailong Yao
at Univ of California San Diego
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | October 17, 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Lithography, Optical lithography, Etching, Manufacturing, Computer programming, Feature extraction, Photomasks, Double patterning technology, Cerium, Overlay metrology

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