Haim Pearl
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 20 March 2020 Presentation + Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Critical dimension metrology, Semiconducting wafers, Process control, 3D metrology, Back end of line, Front end of line, Image quality, 3D image processing, Xenon, Plasma

Proceedings Article | 8 March 2016 Paper
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Inspection, Scanning electron microscopy, Defect detection, Process control, Semiconductor manufacturing, Optical lithography, Image processing, Semiconductors, Manufacturing, Lithography, Semiconducting wafers, Virtual colonoscopy, Optical inspection, Metals

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