Mr. Haitong Tian
at Univ of Illinois
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | October 23, 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Computer simulations, Photomasks, Optical simulations, Double patterning technology, Optimization (mathematics), Model-based design, Algorithms

PROCEEDINGS ARTICLE | March 31, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Semiconductors, Lithography, Electron beam lithography, Optical lithography, Manufacturing, Photomasks, Double patterning technology, Immersion lithography, Vestigial sideband modulation, Optical power tracking algorithms

PROCEEDINGS ARTICLE | March 28, 2014
Proc. SPIE. 9049, Alternative Lithographic Technologies VI
KEYWORDS: Lithography, Electron beam lithography, Lithium, Optical lithography, Annealing, Manufacturing, Directed self assembly, Optimization (mathematics), Baryon acoustic oscillations, Standards development

PROCEEDINGS ARTICLE | September 10, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Manufacturing, Legal, Printing, Photomasks, Immersion lithography, Standards development, Evolutionary algorithms

PROCEEDINGS ARTICLE | March 29, 2013
Proc. SPIE. 8684, Design for Manufacturability through Design-Process Integration VII
KEYWORDS: Lithography, Optical lithography, Detection and tracking algorithms, Computer programming, Printing, Process control, Photomasks, Immersion lithography, 193nm lithography, Optical power tracking algorithms

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