Dr. Hajime Aoyama
at Nikon Corp
SPIE Involvement:
Author
Publications (42)

Proceedings Article | 5 October 2023 Presentation + Paper
Satoru Odate, Naooki Saito, Kosuke Suzuki, Hajime Aoyama, Koichi Kusuyama, Yasunobu Nakamura, Hiroyuki Tsukamoto
Proceedings Volume 12652, 1265205 (2023) https://doi.org/10.1117/12.2675964
KEYWORDS: Immersion lithography, Superconductors, Fabrication, Semiconducting wafers, Quantum circuits, Quantum communications, Resonators, Quantum systems, Quantum numbers, Quantum computers

Proceedings Article | 18 March 2015 Paper
Zhengkai Yang, Wuping Wang, Quan Chen, Hajime Aoyama, Kengo Takemasa, Toshihiko Sei, Tami Miyazawa, Tomoyuki Matsuyama, Chun Shao
Proceedings Volume 9426, 942621 (2015) https://doi.org/10.1117/12.2086062
KEYWORDS: Optical simulations, Critical dimension metrology, Scanners, Lithography, Photomasks, Optical proximity correction, Performance modeling, Photoresist processing, Immersion lithography, Data modeling

Proceedings Article | 31 March 2014 Paper
Hajime Aoyama, Toshiharu Nakashima, Taro Ogata, Shintaro Kudo, Naonori Kita, Junji Ikeda, Ryota Matsui, Hajime Yamamoto, Ayako Sukegawa, Katsushi Makino, Masayuki Murayama, Kazuo Masaki, Tomoyuki Matsuyama
Proceedings Volume 9052, 90520A (2014) https://doi.org/10.1117/12.2046547
KEYWORDS: Reticles, Photomasks, Scanners, Critical dimension metrology, Semiconducting wafers, Lithography, Electroluminescence, Error analysis, Distortion, Data modeling

SPIE Journal Paper | 2 December 2013 Open Access
Hirohiko Izumi, Keiichi Tajima, Joachim Siebert, Wolfgang Demmerle, Tomoyuki Matsuyama, Hajime Aoyama, Yasushi Mizuno, Noriyuki Hirayanagi, Naonori Kita, Ryota Matsui
JM3, Vol. 13, Issue 01, 011005, (December 2013) https://doi.org/10.1117/12.10.1117/1.JMM.13.1.011005
KEYWORDS: Source mask optimization, Scanners, Fiber optic illuminators, Critical dimension metrology, Photomasks, Optical proximity correction, Semiconducting wafers, SRAF, 3D modeling, Printing

Proceedings Article | 12 April 2013 Paper
Hajime Aoyama, Yasushi Mizuno, Noriyuki Hirayanagi, Naonori Kita, Ryota Matsui, Hirohiko Izumi, Keiichi Tajima, Joachim Siebert, Wolfgang Demmerle, Tomoyuki Matsuyama
Proceedings Volume 8683, 86830M (2013) https://doi.org/10.1117/12.2011353
KEYWORDS: Source mask optimization, Scanners, Optical proximity correction, Electroluminescence, Fiber optic illuminators, Photomasks, Critical dimension metrology, Semiconducting wafers, SRAF, Printing

Showing 5 of 42 publications
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