Dr. Hajime Aoyama
at Nikon Corp
SPIE Involvement:
Author
Publications (41)

Proceedings Article | 18 March 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Lithography, Data modeling, Scanners, Photomasks, Optical simulations, Immersion lithography, Optical proximity correction, Critical dimension metrology, Photoresist processing, Performance modeling

Proceedings Article | 31 March 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Lithography, Reticles, Data modeling, Scanners, Error analysis, Distortion, Electroluminescence, Photomasks, Critical dimension metrology, Semiconducting wafers

SPIE Journal Paper | 2 December 2013
JM3 Vol. 13 Issue 01
KEYWORDS: Source mask optimization, Scanners, Fiber optic illuminators, Critical dimension metrology, Photomasks, Optical proximity correction, Semiconducting wafers, SRAF, 3D modeling, Printing

Proceedings Article | 12 April 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Reticles, Metrology, Image processing, Scanners, Wavefronts, Distortion, Photomasks, Semiconducting wafers, Overlay metrology, Fiber optic illuminators

Proceedings Article | 12 April 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Semiconductors, Lithography, Diffraction, Lithographic illumination, Ions, Control systems, Photomasks, Immersion lithography, Critical dimension metrology, Neodymium

Showing 5 of 41 publications
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