Hajime Furutani
at FUJIFILM Corp
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Lithography, Polymers, Photons, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers, Polymer thin films, Absorption

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Lithography, Contamination, Metals, Chemistry, Manufacturing, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Stochastic processes, Absorption

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Lithography, Polymers, Image processing, Scanners, Coating, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Immersion lithography, High volume manufacturing, Fluorine, Photoresist processing, Semiconducting wafers, Research management, Chemically amplified resists

PROCEEDINGS ARTICLE | March 20, 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Lithography, Optical lithography, Polymers, Diffusion, Electroluminescence, Scanning electron microscopy, Immersion lithography, Photoresist processing, Semiconducting wafers, Research management

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