Hajime Furutani
Research Engineer at FUJIFILM Corp
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 13 March 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Lithography, Polymers, Photons, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers, Polymer thin films, Absorption

Proceedings Article | 16 October 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Lithography, Contamination, Metals, Chemistry, Manufacturing, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Stochastic processes, Absorption

Proceedings Article | 27 March 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Lithography, Polymers, Image processing, Scanners, Coating, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Immersion lithography, High volume manufacturing, Fluorine, Photoresist processing, Semiconducting wafers, Research management, Chemically amplified resists

Proceedings Article | 20 March 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Lithography, Optical lithography, Polymers, Diffusion, Electroluminescence, Scanning electron microscopy, Immersion lithography, Photoresist processing, Semiconducting wafers, Research management

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