Dr. Hakki Ergun Cekli
at ASML Netherlands BV
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 13 March 2018 Paper
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Lithography, Metrology, Optical parametric oscillators, Optical lithography, Principal component analysis, Scanners, Pattern recognition, Fingerprint recognition, Manufacturing, Process control, Semiconducting wafers, Overlay metrology

Proceedings Article | 8 March 2016 Paper
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Actuators, Lithography, Reticles, Metrology, Lithium, Image processing, Scanners, Image registration, Process control, Photomasks, Chemical elements, Semiconducting wafers, Yield improvement, Overlay metrology

Proceedings Article | 23 October 2015 Paper
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Reticles, Metrology, Data modeling, Scanners, Image registration, Pellicles, Photomasks, Optical alignment, Semiconducting wafers, Overlay metrology

Proceedings Article | 19 March 2015 Paper
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Actuators, Reticles, Metrology, Lithium, Scanners, Distortion, Image registration, Photomasks, Semiconducting wafers, Overlay metrology

Proceedings Article | 29 October 2014 Paper
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Reticles, Metrology, Etching, Metals, Scanners, Image registration, Photomasks, Optical alignment, Semiconducting wafers, Overlay metrology

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