Dr. Hakseung Han
at Samsung Electronics Co Ltd
SPIE Involvement:
Author
Publications (23)

Proceedings Article | 5 October 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Lithography, Reticles, Metrology, Deep ultraviolet, Calibration, Databases, Image registration, Photomasks, Extreme ultraviolet, Overlay metrology

Proceedings Article | 10 May 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Semiconductors, Metrology, Statistical analysis, Image processing, Scanning electron microscopy, Image quality, Photomasks, Optical proximity correction, Critical dimension metrology, Neodymium

Proceedings Article | 16 September 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Metrology, Logic, Image processing, Image analysis, Printing, Photomasks, Computed tomography, Logic devices, Optical proximity correction, Critical dimension metrology

Proceedings Article | 27 May 2009
Proc. SPIE. 7470, 25th European Mask and Lithography Conference
KEYWORDS: Multilayers, Reticles, Deep ultraviolet, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Defect inspection

Proceedings Article | 18 March 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Refractive index, Silicon, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Semiconducting wafers, Ruthenium, Phase shifts

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Monochromatic aberrations, Mirrors, Imaging systems, Inspection, CCD cameras, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical alignment, Contrast transfer function

Showing 5 of 23 publications
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