Han-Byul Kang
at Photronics Inc
SPIE Involvement:
Author
Publications (5)

SPIE Journal Paper | January 1, 2007
JM3 Vol. 6 Issue 01
KEYWORDS: Ions, Air contamination, Photomasks, Chromatography, Potassium, Phase shifts, Lithography, Thermal effects, Chemical analysis, Materials science

PROCEEDINGS ARTICLE | November 8, 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Carbon, Air contamination, Ions, Chromium, Laser irradiation, Photomasks, Chemical analysis, Natural surfaces, Contamination control, Mask cleaning

PROCEEDINGS ARTICLE | June 28, 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Air contamination, Ultraviolet radiation, Ions, Manufacturing, Humidity, Photomasks, Chemical analysis, Semiconducting wafers, Chromatography, 193nm lithography

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Lithography, Air contamination, Ions, Thermal effects, Transmittance, Photomasks, Scanning probe microscopy, Semiconducting wafers, Chromatography, 193nm lithography

PROCEEDINGS ARTICLE | May 12, 2004
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Air contamination, Ions, Inspection, Chromium, Laser irradiation, Pellicles, Laser scanners, Photomasks, Pulsed laser operation, Chromatography

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