Han-Byul Kang
at Photronics Inc
SPIE Involvement:
Author
Publications (5)

SPIE Journal Paper | 1 January 2007
JM3 Vol. 6 Issue 01
KEYWORDS: Ions, Air contamination, Photomasks, Chromatography, Potassium, Phase shifts, Lithography, Thermal effects, Chemical analysis, Materials science

Proceedings Article | 8 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Air contamination, Photomasks, Natural surfaces, Chromium, Contamination control, Chemical analysis, Ions, Mask cleaning, Laser irradiation, Carbon

Proceedings Article | 28 June 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Air contamination, Ions, Photomasks, Humidity, Chromatography, Ultraviolet radiation, Semiconducting wafers, Chemical analysis, Manufacturing, 193nm lithography

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Photomasks, Air contamination, Pellicles, Laser irradiation, Ions, Pulsed laser operation, Chromium, Chromatography, Inspection, Laser scanners

Proceedings Article | 10 May 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Ions, Photomasks, Air contamination, Chromatography, 193nm lithography, Thermal effects, Transmittance, Scanning probe microscopy, Semiconducting wafers, Lithography

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