Han-En Hsing
at KLA Taiwan
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 16 March 2016
Proc. SPIE. 9781, Design-Process-Technology Co-optimization for Manufacturability X
KEYWORDS: Target detection, Etching, Control systems, Time metrology, Process control, Semiconductor manufacturing, Critical dimension metrology, Semiconducting wafers, Overlay metrology, Imaging metrology

Proceedings Article | 19 March 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Metrology, Optical lithography, Scatterometry, Signal processing, Photomasks, Semiconducting wafers, Scatter measurement, Overlay metrology, Back end of line, Front end of line

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