Dr. Han-Hao Cheng
Senior Process Engineer at Australian National Fabrication Facility
SPIE Involvement:
Area of Expertise:
Directed Self Assembly , Nanofabrication , Two photon nanolithography , Electron Beam Lithography , Nanoscale electronics , Metrology
Profile Summary

I am a professional officer at ANFF-Q, an institute funded by the Australian federal government for enabling nano/microelectronic and scientific research programs under the funding scheme of NCRIS (2007-2015).
I have been developing advanced lithography processes in micro/nanoelectronics for 10 years. In the past I have worked on directed self assembly of 8 nm half pitch structures for Intel Corp., and have assisted Intel, Sematech, Dow Chemical on developing novel lithography materials.
Publications (6)

Proceedings Article | 13 March 2019 Presentation
Christiaan Bekker, Christopher Baker, Rachpon Kalra, Han-Hao Cheng, Bei-Bei Li, Varun Prakash, Warwick Bowen
Proceedings Volume 10904, 1090404 (2019) https://doi.org/10.1117/12.2513747
KEYWORDS: Optical microcavities, Telecommunications, Photonic integrated circuits, Optical filters, Laser optics, Networks, Optical interconnects, Computer architecture, Quantum networks, Radar

SPIE Journal Paper | 21 July 2014
Thomas Bennett, Kevin Pei, Han-Hao Cheng, Kristofer Thurecht, Kevin Jack, Idriss Blakey
JM3, Vol. 13, Issue 03, 031304, (July 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.3.031304
KEYWORDS: Picosecond phenomena, Polymethylmethacrylate, Thin films, Liquids, Polymers, Scattering, Scanning electron microscopy, Laser scattering, Annealing, Directed self assembly

Proceedings Article | 28 March 2014 Paper
Thomas Bennett, Kevin Pei, Han-Hao Cheng, Kristofer Thurecht, Kevin Jack, Idriss Blakey
Proceedings Volume 9049, 90490R (2014) https://doi.org/10.1117/12.2046296
KEYWORDS: Liquids, Picosecond phenomena, Scattering, Thin films, Polymers, Scanning electron microscopy, Semiconducting wafers, Annealing, X-rays, Directed self assembly

Proceedings Article | 26 March 2013 Paper
Ya-Mi Chuang, Han-Hao Cheng, Kevin Jack, Andrew Whittaker, Idriss Blakey
Proceedings Volume 8680, 868009 (2013) https://doi.org/10.1117/12.2012488
KEYWORDS: Polymers, Annealing, Line edge roughness, Lithography, Semiconducting wafers, Atomic force microscopy, Electron beam lithography, Directed self assembly, Extreme ultraviolet lithography, Photoresist materials

Proceedings Article | 21 March 2012 Paper
Proceedings Volume 8323, 83231O (2012) https://doi.org/10.1117/12.916744
KEYWORDS: Line edge roughness, Extreme ultraviolet lithography, Picosecond phenomena, Polymers, Lithography, Directed self assembly, Photoresist materials, Etching, Glasses, Reactive ion etching

Showing 5 of 6 publications
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