Dr. Han-Ku Cho
Director at ASML Korea Co Ltd
SPIE Involvement:
Conference Program Committee | Author
Publications (149)

PROCEEDINGS ARTICLE | September 20, 2013
Proc. SPIE. 8819, Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VII
KEYWORDS: Oxides, Ferromagnetics, Ions, Silicon, Resistance, Magnetism, Transmission electron microscopy, Ion beams, Semiconducting wafers, Gallium

PROCEEDINGS ARTICLE | September 9, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Semiconductors, Manufacturing, Control systems, Telecommunications, Process control, Photomasks, Extreme ultraviolet, Mask making, Semiconducting wafers, Wafer manufacturing

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Semiconductors, Electron beams, Contamination, Data modeling, Calibration, Reliability, Photomasks, Associative arrays, Beam shaping, Vestigial sideband modulation

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Lithography, Electron beam lithography, Scattering, Monte Carlo methods, Photomasks, Extreme ultraviolet, Double patterning technology, Critical dimension metrology, Semiconducting wafers, Astatine

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Wafer-level optics, Defect detection, Modulation, Scanners, Inspection, Reflectivity, Scanning electron microscopy, Photomasks, Extreme ultraviolet lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Electron beam lithography, Calibration, Error analysis, Inspection, Image registration, Photomasks, Mask making, Critical dimension metrology, Line edge roughness, Vestigial sideband modulation

Showing 5 of 149 publications
Conference Committee Involvement (6)
Photomask Technology
13 September 2010 | Monterey, California, United States
Photomask Technology
15 September 2009 | Monterey, California, United States
Photomask Technology
7 October 2008 | Monterey, California, United States
Photomask Technology
18 September 2007 | Monterey, California, United States
Optical Microlithography XX
27 February 2007 | San Jose, California, United States
Showing 5 of 6 published special sections
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