Dr. Han-shin Lee
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 20 May 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Air contamination, Scanners, Ions, Silicon, Transmission electron microscopy, Pellicles, Photomasks, Wet etching, Critical dimension metrology, Molybdenum

Proceedings Article | 28 June 2013
Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX
KEYWORDS: Etching, Air contamination, Crystals, Ions, Inspection, Photomasks, Chemical analysis, Mask making, Chlorine, Chlorine gas

Proceedings Article | 23 March 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Contamination, Air contamination, Ions, Photomasks, Extreme ultraviolet, Chemical analysis, Extreme ultraviolet lithography, Scanning probe microscopy, Mask cleaning, Industrial chemicals

Proceedings Article | 14 October 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Optical lithography, Cadmium, Deep ultraviolet, Reflectivity, Surface roughness, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Scanning probe microscopy, Ruthenium

Proceedings Article | 25 September 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Carbon, Lithography, Carbon dioxide, Gases, Atomic force microscopy, Oxygen, Extreme ultraviolet lithography, Scanning probe microscopy, Ozone, Ruthenium

Showing 5 of 11 publications
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