Dr. Hans-Juergen Mann
at Carl Zeiss SMT AG
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 18 March 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Mirrors, Reticles, Coating, Reflectivity, Wavefronts, Projection systems, Extreme ultraviolet, Extreme ultraviolet lithography, Optics manufacturing, EUV optics

Proceedings Article | 15 October 2005
Proc. SPIE. 5962, Optical Design and Engineering II
KEYWORDS: Lithography, Microscopes, Monochromatic aberrations, Mirrors, Optical design, Lenses, Reflectivity, Relays, Extreme ultraviolet, Reflector telescopes

Proceedings Article | 8 November 2000
Proc. SPIE. 4146, Soft X-Ray and EUV Imaging Systems
KEYWORDS: Lithography, Mirrors, Optical design, Beam splitters, Patents, Deep ultraviolet, Lenses, Lens design, Aspheric lenses, Combined lens-mirror systems

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