Dr. Hans Eisenmann
Director at PDF Solutions GmbH
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | July 10, 2003
Proc. SPIE. 5042, Design and Process Integration for Microelectronic Manufacturing
KEYWORDS: Lithography, Etching, Image processing, Silicon, Data processing, Photomasks, Artificial intelligence, Optical proximity correction, Critical dimension metrology, Photoresist processing

PROCEEDINGS ARTICLE | May 28, 2003
Proc. SPIE. 5148, 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents
KEYWORDS: Data modeling, Etching, Dry etching, Chromium, Photomasks, Plasma etching, Convolution, Critical dimension metrology, Chlorine, Data corrections

PROCEEDINGS ARTICLE | December 27, 2002
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Data modeling, Etching, Dry etching, Chromium, Photomasks, Computed tomography, Plasma etching, Convolution, Critical dimension metrology, Data corrections

PROCEEDINGS ARTICLE | April 9, 2001
Proc. SPIE. 4349, 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents
KEYWORDS: Lithography, Electron beam lithography, Magnesium, Clocks, Sun, Computing systems, Data processing, Photomasks, Optical proximity correction, Data conversion

PROCEEDINGS ARTICLE | June 25, 1999
Proc. SPIE. 3676, Emerging Lithographic Technologies III
KEYWORDS: Lithography, Electron beam lithography, Modulation, Scattering, Laser scattering, Photomasks, Optical proximity correction, Convolution, Raster graphics, X-ray lithography

PROCEEDINGS ARTICLE | April 23, 1999
Proc. SPIE. 3665, 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98
KEYWORDS: Electron beam lithography, Scattering, Laser scattering, Photomasks, Optical simulations, Optical proximity correction, Convolution, Raster graphics, Spatial resolution, X-ray lithography

Showing 5 of 8 publications
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