Dr. Hans Eisenmann
Director at PDF Solutions GmbH
SPIE Involvement:
Publications (9)

Proceedings Article | 30 April 2023 Presentation
Proceedings Volume 12495, 1249513 (2023) https://doi.org/10.1117/12.2658022
KEYWORDS: Deconvolution, Machine learning, Logic, Design for manufacturing

Proceedings Article | 10 July 2003 Paper
Hans Eisenmann, Kai Peter, Andrzej Strojwas
Proceedings Volume 5042, (2003) https://doi.org/10.1117/12.497476
KEYWORDS: Optical proximity correction, Photomasks, Lithography, Silicon, Image processing, Etching, Critical dimension metrology, Artificial intelligence, Data processing, Photoresist processing

Proceedings Article | 28 May 2003 Paper
Proceedings Volume 5148, (2003) https://doi.org/10.1117/12.515122
KEYWORDS: Critical dimension metrology, Etching, Photomasks, Data corrections, Data modeling, Dry etching, Convolution, Chromium, Plasma etching, Chlorine

Proceedings Article | 27 December 2002 Paper
Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467572
KEYWORDS: Critical dimension metrology, Etching, Data corrections, Photomasks, Dry etching, Data modeling, Convolution, Plasma etching, Chromium, Computed tomography

Proceedings Article | 9 April 2001 Paper
Hans Eichhorn, Melchior Lemke, Juergen Gramss, B. Buerger, Uwe Baetz, Nikola Belic, Hans Eisenmann
Proceedings Volume 4349, (2001) https://doi.org/10.1117/12.425088
KEYWORDS: Magnesium, Computing systems, Data processing, Lithography, Sun, Photomasks, Optical proximity correction, Electron beam lithography, Data conversion, Clocks

Showing 5 of 9 publications
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