Dr. Hans A. Fosshaug Profile

Dr. Hans A. Fosshaug

Project Manager

SPIE Involvement:

Author

Publications (14)

Proceedings Article | 11 May 2007 Paper

Embedded optical proximity correction for the Sigma7500 DUV mask writer

Anders Österberg, Lars Ivansen, Henrik Åhlfeldt, Hans Fosshaug, Tom Newman, Amanda Bowhill, Emile Sahouria, Steffen Schulze

Proceedings Volume 6607, 660704 (2007) https://doi.org/10.1117/12.728918

KEYWORDS: Photomasks, Optical proximity correction, Calibration, Semiconducting wafers, Deep ultraviolet, Systems modeling, Spatial light modulators, Matrices, Model-based design, Lithography

Read Abstract +

Proceedings Article | 3 May 2007 Paper

Improved CD uniformity for advanced masks using the Sigma7500 pattern generator and ProcessEqualizer

Robert Eklund, Anders Österberg, Jonas Hellgren, Hans Fosshaug, Tord Karlin, Tom Newman

Proceedings Volume 6533, 65330C (2007) https://doi.org/10.1117/12.736923

KEYWORDS: Photomasks, Critical dimension metrology, Spatial light modulators, Convolution, Raster graphics, Neodymium, Electron beam lithography, Data modeling, Deep ultraviolet, Printing

Read Abstract +

Proceedings Article | 20 May 2006 Paper

Reducing process contributions to CD error range using the Sigma7500 pattern generator and ProcessEqualizer

Jonas Hellgren, Hans Fosshaug, Anders Österberg, Lars Ivansen

Proceedings Volume 6283, 62831I (2006) https://doi.org/10.1117/12.681743

KEYWORDS: Critical dimension metrology, Photomasks, Convolution, Etching, Spatial light modulators, Data modeling, Raster graphics, Plasma etching, Printing, Deep ultraviolet

Read Abstract +

Proceedings Article | 12 May 2005 Paper

Some aspects on mechanisms responsible for contamination of optical components in DUV lithographic exposure tools

Hans Fosshaug, Mats Ekberg, Gunnar Kylberg

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600312

KEYWORDS: Molecules, Contamination, Adsorption, Diffusion, Deep ultraviolet, Oxides, Polarizability, Absorption, Ozone, Lithography

Read Abstract +

Proceedings Article | 4 May 2005 Paper

Managing effects in CD control from PED and PEB in advanced DUV photomask manufacturing using FEP-171 resist

Adisa Paulsson, Kezhao Xing, Hans Fosshaug, Axel Lundvall, Charles Bjoernberg, Johan Karlsson

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599938

KEYWORDS: Photomasks, Diffusion, Lithography, Critical dimension metrology, Deep ultraviolet, Photoresist processing, Control systems, Chemically amplified resists, Temperature metrology, Manufacturing

Read Abstract +

Proceedings Article | 6 December 2004 Paper

Characterization of 193-nm resists for optical mask manufacturing

Hans Fosshaug, Adisa Paulsson, Uldis Berzinsh, Helena Magnusson

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.570097

KEYWORDS: Photomasks, Photoresist processing, Optics manufacturing, Etching, Resistance, Semiconducting wafers, Deep ultraviolet, Scanning electron microscopy, Excimer lasers, 193nm lithography

Read Abstract +

Proceedings Article | 6 December 2004 Paper

FEP-171 resist thickness optimization and dry etch screening on NTAR7 chrome substrates for Sigma7300 DUV laser pattern generator

Johan Karlsson, Kezhao Xing, Adisa Bajramovic, Henrik Dahlberg, Charles Bjornberg, Peter Hogfeldt, Lars Kjellberg, Hans Fosshaug, Anna Dahlberg, Axel Lundvall

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569653

KEYWORDS: Etching, Dry etching, Photomasks, Diffractive optical elements, Reactive ion etching, Deep ultraviolet, Photoresist processing, Lithography, Image resolution, Manufacturing

Read Abstract +

Proceedings Article | 28 May 2004 Paper

Airborne molecular contamination control in the micromirror SLM-based deep ultraviolet DUV SIGMA7300 laser pattern generator

Mats Ekberg, Hans Fosshaug, Thomas Ostrom, Peter Bjornangen, Thomas Utterback, Per-Uno Skotte, John Higley, David Ruede, Oleg Kishkovich

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535833

KEYWORDS: Photomasks, Deep ultraviolet, Molecules, Chemical analysis, Climatology, Molecular lasers, Spatial light modulators, Contamination, Optical components, Contamination control

Read Abstract +

Proceedings Article | 28 May 2004 Paper

DOE manufacture with the DUV SLM-based Sigma7300 laser pattern generator

Peter Björnängen, Mats Ekberg, Thomas Öström, Hans Fosshaug, Johan Karlsson, Charles Björnberg, Fredrik Nikolajeff, Mikael Karlsson

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535767

KEYWORDS: Diffractive optical elements, Diffraction, Spatial light modulators, Manufacturing, Optics manufacturing, Phase shift keying, Quartz, Refractive index, Photomasks, Stray light

Read Abstract +

Proceedings Article | 24 May 2004 Paper

PSM alignment for Sigma7300: signal quality and resist effects from using the writing DUV laser light, spatial light modulator, and a CCD camera as a measurement tool for 2:nd layer alignment metrology

Thomas Ostrom, Sten Lindau, Mats Ekberg, Hans Fosshaug, Raoul Zerne

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.535830

KEYWORDS: Reflectivity, Spatial light modulators, Optical alignment, Deep ultraviolet, Charge-coupled devices, Image quality, Quartz, CCD cameras, Autoregressive models, Antireflective coatings

Read Abstract +

Proceedings Article | 14 May 2004 Paper

Influence of writing strategy on CD control for the spatial light modulator-based Sigma7300 DUV laser pattern generator

Hans Fosshaug, Per Askebjer, Johan Karlsson, Adisa Bajramovic, Kezhao Xing, Robert Eklund, Jonathan Walford, Mats Ekberg, Peter Hogfeldt, Thomas Öström

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.535821

KEYWORDS: Diffusion, Critical dimension metrology, Photomasks, Deep ultraviolet, Polymers, Printing, Spatial light modulators, Photoresist materials, Chemistry, Chemically amplified resists

Read Abstract +

Proceedings Article | 17 December 2003 Paper

Resist process optimization for a DUV laser pattern generator

Hans Fosshaug, Adisa Bajramovic, Johan Karlsson, Kezhao Xing, Anna Rosendahl, Anna Dahlberg, Charles Bjoernberg, Mans Bjuggren, Torbjorn Sandstrom

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518058

KEYWORDS: Etching, Photoresist processing, Deep ultraviolet, Chromium, Image processing, Scanning electron microscopy, Dry etching, Chemically amplified resists, Laser applications, Photomasks

Read Abstract +

Proceedings Article | 17 December 2003 Paper

Properties of a 248-nm DUV laser mask pattern generator for the 90-nm and 65-nm technology nodes

Johan Aman, Hans Fosshaug, Tobias Hedqvist, Jan Harkesjo, Peter Hogfeldt, Marie Jacobsson, Andrzej Karawajczyk, Johan Karlsson, Mats Rosling, Henrik Sjoberg

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.519970

KEYWORDS: Spatial light modulators, Deep ultraviolet, Photomasks, Laser applications, Excimer lasers, Electron beams, Optical proximity correction, Coherence imaging, Electronics, Particles

Read Abstract +

Proceedings Article | 27 December 2002 Paper

Laser PG performance for 100-nm photomasks

Mats Rosling, Andrzej Karawajczyk, Per Askebjer, Raoul Zerne, Allen Carroll, Robert Eklund, Hans Fosshaug, Torbjoern Sandstrom

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468622

KEYWORDS: Spatial light modulators, Photomasks, Critical dimension metrology, Micromirrors, Analog electronics, Deep ultraviolet, Mirrors, Image resolution, Manufacturing, Electron beam lithography

Read Abstract +

Showing 5 of 14 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years