Dr. Hans Koop
Application Engineer at Synopsys GmbH
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 1 November 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Lithography, Finite-difference time-domain method, 3D acquisition, Polarization, Image processing, 3D modeling, Photomasks, Optical proximity correction, Electromagnetism, 3D image processing

Proceedings Article | 30 October 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Carbon, Reticles, Waveguides, Opacity, Particles, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 12 May 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Lithography, Apodization, Cadmium, Polarization, Pellicles, Image quality, Projection systems, Photomasks, Optical proximity correction, Critical dimension metrology

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