Dr. Hans Loeschner
Co-Founder & Senior Advisor at IMS Nanofabrication GmbH
SPIE Involvement:
Conference Program Committee | Conference Chair | Author
Area of Expertise:
maskless lithography and nanopatterning , electron and ion multi-beam technology
Websites:
Publications (60)

SPIE Journal Paper | 10 February 2024 Open Access
Mathias Tomandl, Christoph Spengler, Peter Hudek, Christof Klein, Hans Loeschner, Elmar Platzgummer
JM3, Vol. 23, Issue 01, 011205, (February 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.1.011205
KEYWORDS: Extreme ultraviolet, Distortion, Lenses, Nanofabrication, Industry, Magnetism, Industrial applications, Lithography, Extreme ultraviolet lithography, Projection systems

Proceedings Article | 22 November 2023 Presentation
Mathias Tomandl, Christof Klein, Hans Loeschner, Elmar Platzgummer
Proceedings Volume PC12751, PC127510I (2023) https://doi.org/10.1117/12.2688257
KEYWORDS: Vestigial sideband modulation, Optical proximity correction, Industrial applications, Standards development, Reliability, Photomasks, Nanofabrication, Logic, Lithography, Line edge roughness

Proceedings Article | 22 November 2023 Presentation
Proceedings Volume PC12751, PC127510R (2023) https://doi.org/10.1117/12.2688204
KEYWORDS: Lithography, Nanofabrication, Extreme ultraviolet, Standards development, Optical lithography

Proceedings Article | 5 October 2023 Paper
Mathias Tomandl, Christoph Spengler, Christof Klein, Hans Loeschner, Elmar Platzgummer
Proceedings Volume 12802, 1280204 (2023) https://doi.org/10.1117/12.2678532
KEYWORDS: Distortion, Lenses, Nanofabrication, Magnetism, Extreme ultraviolet, Industry, Projection systems, Industrial applications, Mask making, Advanced patterning

Proceedings Article | 30 April 2023 Presentation
Christof Klein, Hans Loeschner, Elmar Platzgummer
Proceedings Volume PC12497, PC1249707 (2023) https://doi.org/10.1117/12.2661123
KEYWORDS: Standards development, Extreme ultraviolet

Showing 5 of 60 publications
Conference Committee Involvement (29)
39th European Mask and Lithography Conference (EMLC 2024)
17 June 2024 | Grenoble, France
Novel Patterning Technologies 2024
26 February 2024 | San Jose, California, United States
38th European Mask and Lithography Conference
19 June 2023 | Dresden, Germany
Novel Patterning Technologies 2023
27 February 2023 | San Jose, California, United States
Novel Patterning Technologies 2022
25 April 2022 | San Jose, California, United States
Showing 5 of 29 Conference Committees
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