Prof. Hans Lüth
at Forschungszentrum Jülich GmbH
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 20 September 2018 Presentation + Paper
Proceedings Volume 10732, 107320V (2018) https://doi.org/10.1117/12.2322720
KEYWORDS: Tellurium, Bismuth, Antimony, Modulation, Fourier transforms, Doping, Resistance, Molecular beam epitaxy, Nanolithography

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