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Hans Pan
at Xilinx Inc
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Publications (1)
Proceedings Article | 16 September 2014 Paper
Double-patterning optimization in 20nm SRAM design
Qi Lin, Toshiyuki Hisamura, Nui Chong, Hans Pan, Yun Wu, Jonathan Chang, Xin Wu
Proceedings Volume 9235, 923505 (2014) https://doi.org/10.1117/12.2066262
KEYWORDS: Double patterning technology, Diffusion, Photomasks, Optical proximity correction, Critical dimension metrology, Silicon, Field programmable gate arrays, Semiconducting wafers, Optical lithography, Optical alignment
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