Dr. Hans Vloeberghs
at FUJIFILM Electronic Materials Europe NV
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 7 July 1997 Paper
Proc. SPIE. 3049, Advances in Resist Technology and Processing XIV
KEYWORDS: Tin, Deep ultraviolet, Nitrogen, Absorbance, Contamination, Metals, Optical lithography, Semiconducting wafers, Reflectivity, Optical properties

Proceedings Article | 26 May 1995 Paper
Proc. SPIE. 2440, Optical/Laser Microlithography VIII
KEYWORDS: Refractive index, Fabry–Perot interferometers, Oxides, Interfaces, Reflectivity, Silicon, Phase shifts, Photoresist developing, Aluminum, Photoresist materials

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top