Dr. Hans van der Laan
at ASML Netherlands BV
SPIE Involvement:
Publications (16)

Proceedings Article | 28 March 2017 Paper
Yue Zhou, DeNeil Park, Karsten Gutjahr, Abhishek Gottipati, Tam Vuong, Sung Yong Bae, Nicholas Stokes, Aiqin Jiang, Po Ya Hsu, Mark O'Mahony, Andrea Donini, Bart Visser, Chris de Ruiter, Grzegorz Grzela, Hans van der Laan, Martin Jak, Pavel Izikson, Stephen Morgan
Proceedings Volume 10145, 101452G (2017) https://doi.org/10.1117/12.2257913
KEYWORDS: Overlay metrology, Metrology, Scatterometry, Environmental sensing, Image processing, Diffraction gratings, Diffraction, Chemical mechanical planarization, Defense and security, Image analysis

Proceedings Article | 24 March 2016 Paper
M. Ebert, P. Vanoppen, M. Jak, G. v. d. Zouw, H. Cramer, T. Nooitgedagt, H. v. d. Laan
Proceedings Volume 9778, 97782N (2016) https://doi.org/10.1117/12.2219946
KEYWORDS: Control systems, Overlay metrology, Metrology, Optical metrology, Process control, Critical dimension metrology, Diffraction, Signal processing, Image processing, Scatterometry, Opacity, Semiconducting wafers, Lithography, Scanners

Proceedings Article | 12 April 2013 Paper
Proceedings Volume 8683, 86831J (2013) https://doi.org/10.1117/12.2011550
KEYWORDS: Semiconducting wafers, Scanners, Overlay metrology, Metrology, Lithography, Actuators, Calibration, Reticles, Photomasks, Control systems

Proceedings Article | 12 April 2013 Paper
Proceedings Volume 8683, 86830P (2013) https://doi.org/10.1117/12.2011507
KEYWORDS: Overlay metrology, Metrology, Scanners, Sensors, Semiconducting wafers, Yield improvement, Signal processing, Scatterometry, Control systems, Wafer manufacturing

Proceedings Article | 3 April 2012 Paper
Jongsu Lee, Chang Moon Lim, Chan-Ho Ryu, Myoungsoo Kim, Hyosang Kang, Hugo Cramer, Noelle Wright, Birgitt Hepp, Liesbeth van Reijnen, Hans van der Laan, Maryana Marun, Peter ten Berge
Proceedings Volume 8324, 83241V (2012) https://doi.org/10.1117/12.917824
KEYWORDS: Critical dimension metrology, Optical lithography, Double patterning technology, Deposition processes, Scatterometry, Semiconducting wafers, Process control, Etching, Metrology, Control systems

Showing 5 of 16 publications
  • View contact details

Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top