Dr. Hans van der Laan
at ASML Netherlands BV
SPIE Involvement:
Author
Publications (16)

Proceedings Article | 28 March 2017 Paper
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Defense and security, Diffraction, Metrology, Image processing, Image analysis, Scatterometry, Environmental sensing, Overlay metrology, Chemical mechanical planarization, Diffraction gratings

Proceedings Article | 24 March 2016 Paper
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Lithography, Diffraction, Metrology, Opacity, Image processing, Scanners, Control systems, Scatterometry, Optical metrology, Signal processing, Process control, Critical dimension metrology, Semiconducting wafers, Overlay metrology

Proceedings Article | 12 April 2013 Paper
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Actuators, Lithography, Reticles, Metrology, Calibration, Scanners, Control systems, Photomasks, Semiconducting wafers, Overlay metrology

Proceedings Article | 12 April 2013 Paper
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Metrology, Sensors, Scanners, Control systems, Scatterometry, Signal processing, Semiconducting wafers, Yield improvement, Wafer manufacturing, Overlay metrology

Proceedings Article | 3 April 2012 Paper
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Metrology, Optical lithography, Etching, Control systems, Scatterometry, Process control, Double patterning technology, Deposition processes, Critical dimension metrology, Semiconducting wafers

Showing 5 of 16 publications
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