Dr. Hans van der Laan
at ASML Netherlands BV
SPIE Involvement:
Author
Publications (16)

Proceedings Article | 28 March 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Overlay metrology, Metrology, Scatterometry, Environmental sensing, Image processing, Diffraction gratings, Diffraction, Chemical mechanical planarization, Defense and security, Image analysis

Proceedings Article | 24 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Control systems, Overlay metrology, Metrology, Optical metrology, Process control, Critical dimension metrology, Diffraction, Signal processing, Image processing, Scatterometry, Opacity, Semiconducting wafers, Lithography, Scanners

Proceedings Article | 12 April 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Semiconducting wafers, Scanners, Overlay metrology, Metrology, Lithography, Actuators, Calibration, Reticles, Photomasks, Control systems

Proceedings Article | 12 April 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Overlay metrology, Metrology, Scanners, Sensors, Semiconducting wafers, Yield improvement, Signal processing, Scatterometry, Control systems, Wafer manufacturing

Proceedings Article | 3 April 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Critical dimension metrology, Optical lithography, Double patterning technology, Deposition processes, Scatterometry, Semiconducting wafers, Process control, Etching, Metrology, Control systems

Showing 5 of 16 publications
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