Dr. Hao D. Xiong
at Vanderbilt Univ
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | May 23, 2005
Proc. SPIE. 5844, Noise in Devices and Circuits III
KEYWORDS: Oxides, Annealing, Dielectrics, Silicon, Measurement devices, Aluminum, Transistors, Field effect transistors, Molybdenum, Semiconducting wafers

PROCEEDINGS ARTICLE | May 12, 2003
Proc. SPIE. 5113, Noise in Devices and Circuits
KEYWORDS: Oxides, Silicon, Diffusion, Measurement devices, Transistors, Field effect transistors, Radiation effects, Molybdenum, Semiconducting wafers, Temperature metrology

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