Dr. Hari Pathangi
at KLA Corp.
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Wafer-level optics, Defect detection, Modulation, Inspection, Extreme ultraviolet, Semiconducting wafers, Stochastic processes, EUV optics, Defect inspection

SPIE Journal Paper | 11 April 2017
JM3 Vol. 16 Issue 02
KEYWORDS: Directed self assembly, Line edge roughness, Line width roughness, Lithography, Metrology, Scanning electron microscopy, Silicon, Critical dimension metrology, Image segmentation, Picosecond phenomena

Proceedings Article | 1 April 2016 Paper
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Lithography, Optical lithography, Atmospheric plasma, Etching, Annealing, Chemical vapor deposition, Photoresist materials, Directed self assembly, Semiconducting wafers, Front end of line

Proceedings Article | 25 March 2016 Paper
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Nanotechnology, Lithography, Nanostructures, Metrology, Ions, Silicon, Scanning electron microscopy, Line width roughness, Picosecond phenomena, Critical dimension metrology, Line edge roughness, Neodymium, Nanolithography, Correlation function

Proceedings Article | 22 March 2016 Paper
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Lithography, Metrology, Optical lithography, Etching, Polymers, Silicon, Manufacturing, Scanning electron microscopy, Bridges, Directed self assembly, Epitaxy, Thin film coatings, Semiconducting wafers

Showing 5 of 9 publications
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