Dr. Harry J. Levinson
Lithography Consultant at HJL Lithography
SPIE Involvement:
Board of Directors | Fellows Committee | Publications Committee | Strategic Planning Committee | Symposia Committee | Fellow status | Symposium Committee | Symposium Chair | Conference Chair | Conference Co-Chair | Conference Program Committee | Author | Instructor
Area of Expertise:
Lithography
Publications (92)

PROCEEDINGS ARTICLE | March 30, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Semiconductors, Cadmium, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Stochastic processes, Overlay metrology

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Calibration, Metals, Photoresist materials, Monte Carlo methods, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Stochastic processes, Edge roughness, Absorption

PROCEEDINGS ARTICLE | August 30, 2017
Proc. SPIE. 10320, An Introduction to Biological and Artificial Neural Networks for Pattern Recognition

PROCEEDINGS ARTICLE | August 30, 2017
Proc. SPIE. 10321, Single Frequency Semiconductor Lasers

PROCEEDINGS ARTICLE | March 30, 2017
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Logic, Optical lithography, Visualization, Etching, Metals, Error analysis, Manufacturing, Monte Carlo methods, Solids, Photomasks, Directed self assembly, Optical proximity correction, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Lithography, Calibration, Photoresist materials, Monte Carlo methods, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Photoresist processing, Stochastic processes, Edge roughness, EUV optics, Chemically amplified resists

Showing 5 of 92 publications
Conference Committee Involvement (15)
SPIE Advanced Lithography
21 February 2016 | San Jose, United States
SPIE Advanced Lithography
23 February 2014 | San Jose, United States
SPIE Advanced Lithography
24 February 2013 | San Jose, United States
SPIE Advanced Lithography
12 February 2012 | San Jose, United States
SPIE Advanced Lithography
27 February 2011 | San Jose, United States
Showing 5 of 15 published special sections
Course Instructor
SC111: Lithography Process Control
Process control is presented in the context of optical lithography as applied to microelectronics and related technologies. The emphasis for this class will be on relevant lithography science, statistical methods, and the interplay between lithography science and statistical considerations. Much of the material for this class was developed by the instructor and is not available elsewhere.
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