Haruki Iguchi
at Univ of Hyogo
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 9 July 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Reflectometry, Mirrors, Extreme ultraviolet, Reflectivity, Photomasks, Spherical lenses, Switching, Multilayers, Extreme ultraviolet lithography, Synchrotrons

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