Dr. Harun H. Solak
CEO at Eulitha AG
SPIE Involvement:
Author
Profile Summary

Eulitha provides nanolithography services and equipment for research and production. Its revolutionary PHABLE photolithography systems enable low-cost fabrication of periodic nanostructures over large areas. This proprietary technology has wide ranging uses in photonics, optoelectronics, electronics, biotechnology, telecommunication, photovoltaics, sensors and other areas. Eulitha’s custom and standard ranges of nano-patterned substrates are made with electron-beam or its own PHABLE lithography.
Publications (12)

Proceedings Article | 27 March 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Lithography, Optical lithography, Phase contrast, Lithographic illumination, Etching, X-rays, Silicon, Chromium, Photoresist materials, Photomasks, Reactive ion etching, X-ray imaging, Semiconducting wafers

Proceedings Article | 1 May 2012
Proc. SPIE. 8424, Nanophotonics IV
KEYWORDS: Visible radiation, Deep ultraviolet, Polarization, Metals, Polarizers, Infrared radiation, Aluminum, Nanoimprint lithography, Nanophotonics, Nanofabrication

Proceedings Article | 23 March 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Lithography, Silicon, Diffusion, Electroluminescence, Scanning electron microscopy, Photomasks, Extreme ultraviolet lithography, Nanoimprint lithography, Modulation transfer functions, Diffraction gratings

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Polymers, Molecules, Amplifiers, Oxygen, Photoresist materials, Extreme ultraviolet lithography, Line edge roughness, Thermal modeling, Thermodynamics

SPIE Journal Paper | 1 April 2009
JM3 Vol. 8 Issue 02
KEYWORDS: Magnetism, Extreme ultraviolet lithography, Lithography, Extreme ultraviolet, Polymers, Photomasks, Gold, Proteins, Nanolithography, Nanowires

Proceedings Article | 26 March 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Electron beam lithography, Glasses, Molecules, Diffusion, Cadmium sulfide, Extreme ultraviolet lithography, Head-mounted displays, Line edge roughness, Photoresist processing

Showing 5 of 12 publications
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