Hawk J. Kim
Project Manager at
SPIE Involvement:
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Profile Summary

16 years of broad management and customer engagements worldwide in Metrology and Inspection within semiconductor industry.
Publications (1)

PROCEEDINGS ARTICLE | June 5, 2001
Proc. SPIE. 4275, Metrology-based Control for Micro-Manufacturing
KEYWORDS: Defect detection, Copper, Dielectrics, Manufacturing, Inspection, Scanning electron microscopy, Semiconducting wafers, Real-time computing, Classification systems, Chemical mechanical planarization

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