Hazem S. Mesilhy
SPIE Involvement:
Area of Expertise:
Lithography , Computational optics , EUV
Profile Summary

Hazem Mesilhy is a PhD student at Fraunhofer IISB in the Computational Lithography and Optics Group. He got his master’s degree in advanced optical technologies from Friedrich-Alexander University Erlangen-Nürnberg. He received his bachelor’s degree from Cairo University—Faculty of Engineering, Electronics and Electrical Communication Department. His research domain involves the simulation of the lithographic process and the optimization of the process parameters using multi-objective optimization techniques.
Publications (17)

Proceedings Article | 10 April 2024 Presentation + Paper
Proceedings Volume 12953, 1295302 (2024) https://doi.org/10.1117/12.3009996
KEYWORDS: Photomasks, Light sources and illumination, Source mask optimization, Lithography, Near field, Diffraction

Proceedings Article | 1 December 2022 Paper
Proceedings Volume 12293, 122930Y (2022) https://doi.org/10.1117/12.2643246
KEYWORDS: Extreme ultraviolet, Scatterometry, Photomasks, Refractive index, Scattering, Reflectivity, Metrology, Databases, Oxidation, Multilayers, Extreme ultraviolet lithography, Extreme ultraviolet coatings, Modeling and simulation, Optical constants, Optical metrology

Proceedings Article | 13 June 2022 Presentation
Proceedings Volume PC12051, PC1205108 (2022) https://doi.org/10.1117/12.2614174
KEYWORDS: Extreme ultraviolet, Refractive index, Nanoimprint lithography, High volume manufacturing, Extreme ultraviolet lithography, Diffraction, 3D printing, 3D image processing

SPIE Journal Paper | 11 May 2022 Open Access
JM3, Vol. 21, Issue 02, 020901, (May 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.2.020901
KEYWORDS: Photomasks, Extreme ultraviolet, Diffraction, Phase shifts, Refractive index, Extreme ultraviolet lithography, Resolution enhancement technologies, Deep ultraviolet, Reflectivity, Lithography

Proceedings Article | 12 October 2021 Presentation + Paper
Proceedings Volume 11854, 1185405 (2021) https://doi.org/10.1117/12.2600931
KEYWORDS: Photomasks, Mirrors, Extreme ultraviolet, Diffraction, Reflectivity, Extreme ultraviolet lithography, Lithography, Phase shifts, Imaging systems

Showing 5 of 17 publications
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