Linda Yi
MS/Ph.D Student at
SPIE Involvement:
Author
Publications (13)

PROCEEDINGS ARTICLE | March 27, 2015
Proc. SPIE. 9423, Alternative Lithographic Technologies VII
KEYWORDS: Lithography, Optical lithography, Polymers, Annealing, Scanning electron microscopy, Transmission electron microscopy, Directed self assembly, Convolution, Neodymium, Binary data

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9423, Alternative Lithographic Technologies VII
KEYWORDS: Lithography, Nanostructures, Optical lithography, Polymers, Scanning electron microscopy, Transmission electron microscopy, Directed self assembly, Integrated circuits, SRAF, Semiconducting wafers

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9423, Alternative Lithographic Technologies VII
KEYWORDS: Polymethylmethacrylate, Etching, Interfaces, Silicon, 3D modeling, Platinum, Scanning electron microscopy, Transmission electron microscopy, Directed self assembly, System on a chip

PROCEEDINGS ARTICLE | March 28, 2014
Proc. SPIE. 9049, Alternative Lithographic Technologies VI
KEYWORDS: Lithography, Electron beam lithography, Lithium, Optical lithography, Annealing, Manufacturing, Directed self assembly, Optimization (mathematics), Baryon acoustic oscillations, Standards development

PROCEEDINGS ARTICLE | March 28, 2014
Proc. SPIE. 9049, Alternative Lithographic Technologies VI
KEYWORDS: Neck, Lithography, Optical lithography, Polymethylmethacrylate, Polymers, Error analysis, Scanning electron microscopy, Extreme ultraviolet, Directed self assembly, Neodymium

PROCEEDINGS ARTICLE | March 28, 2014
Proc. SPIE. 9049, Alternative Lithographic Technologies VI
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Manufacturing, Printing, Directed self assembly, Integrated circuits, Extreme ultraviolet lithography, Integrated circuit design, Yield improvement

Showing 5 of 13 publications
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