Heba Sharaf
Software Development Engineer at Mentor Graphics
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Lithography, Visualization, Feature extraction, Photomasks, Double patterning technology, Digital electronics, Photomask technology, Prototyping, Standards development, Current controlled current source

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