Hector I. Garcia
Product Marketing Manager at KLA Corp
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 28 August 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Lithography, Reticles, Defect detection, Databases, Ultraviolet radiation, Inspection, SRAF, Semiconducting wafers, 193nm lithography, Defect inspection

Proceedings Article | 2 June 2003
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Lithography, Reticles, Defect detection, Detection and tracking algorithms, Image segmentation, Inspection, Critical dimension metrology, Algorithm development, Semiconducting wafers, Defect inspection

Proceedings Article | 28 May 2003
Proc. SPIE. 5148, 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents
KEYWORDS: Lithography, Reticles, Contamination, Defect detection, Databases, Inspection, Photomasks, Algorithm development, Phase shifts, Defect inspection

Proceedings Article | 27 December 2002
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Reticles, Defect detection, Databases, Inspection, Photomasks, Critical dimension metrology, Algorithm development, Semiconducting wafers, Defect inspection

Proceedings Article | 16 August 2002
Proc. SPIE. 4764, 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents
KEYWORDS: Reticles, Defect detection, Detection and tracking algorithms, Data modeling, Databases, Image processing, Inspection, Image transmission, Optical proximity correction, Algorithm development

Showing 5 of 9 publications
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