Dr. Heebom Kim
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Publications (38)

Proceedings Article | 19 March 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Polymers, Molecules, Electrons, Diffusion, Photoresist materials, Finite difference methods, Extreme ultraviolet lithography, Chemical reactions, Line edge roughness

Proceedings Article | 16 October 2017
Proc. SPIE. 10451, Photomask Technology
KEYWORDS: Scanners, Inspection, Pellicles, Transmittance, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing

Proceedings Article | 28 March 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Mirrors, Metrology, Imaging systems, Inspection, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, SRAF, High volume manufacturing, Semiconducting wafers, Binary data, Airborne remote sensing, EUV optics, Lead

Proceedings Article | 24 March 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Semiconductors, Polymers, Molecules, Electrons, Diffusion, Computer simulations, Photoresist materials, Monte Carlo methods, Extreme ultraviolet lithography, Chemical reactions, Line edge roughness, Photochemistry, Photoresist processing, Photoresist developing

Proceedings Article | 18 March 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Thermography, Thin films, Lithography, Graphene, Crystals, Silicon, Hydrogen, Infrared lasers, Pellicles, Silicon films, Transmittance, Extreme ultraviolet, Extreme ultraviolet lithography

Proceedings Article | 9 July 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Optical lithography, Etching, Image processing, Chromium, Transmittance, Photomasks, Immersion lithography, Nanoimprint lithography, Semiconducting wafers, Phase shifts

Showing 5 of 38 publications
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