Hee-Ra No
at Hanyang Univ
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | October 9, 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Lithography, Optical lithography, Contamination, Particles, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Applied physics

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Monochromatic aberrations, Optical lithography, Scanners, Distortion, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Critical dimension metrology, Optical calibration, Tolerancing

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