Prof. Hee-Youl Lim
at SK Hynix Inc
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 1 April 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Optical lithography, Scanners, Manufacturing, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Optical proximity correction, Critical dimension metrology, Overlay metrology

Proceedings Article | 2 April 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Optical lithography, Data modeling, Control systems, Distortion, Process control, Photomasks, Optical alignment, Semiconducting wafers, Overlay metrology, Chemical mechanical planarization

Proceedings Article | 4 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Diffraction, Optical lithography, Polarization, Scanners, Chromium, Transmittance, Photomasks, Nanoimprint lithography, Binary data

Proceedings Article | 4 December 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Lithography, Optical lithography, Etching, Image processing, Coating, Scanning electron microscopy, Photoresist materials, Photomasks, Extreme ultraviolet, Double patterning technology

Proceedings Article | 2 April 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Metrology, Molecular bridges, Particles, Coating, Bridges, Immersion lithography, Thin film coatings, Photoresist processing, Semiconducting wafers

Showing 5 of 6 publications
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