Mr. HeeHong Yang Profile

HeeHong Yang

Manager of Design Integration at Headway Technologies Inc

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Publications (3)

Proceedings Article | 1 April 2008 Paper

Advanced OPC and 2D verification for tip engineering using aggressive illuminations

X. Zhang, T. Lukanc, H. Yang, B. Ward

Proc. SPIE. 6924, Optical Microlithography XXI

KEYWORDS: Aberration correction, Manufacturing, Scanning electron microscopy, Printing, Bridges, Optical proximity correction, Algorithm development, Semiconducting wafers, Illumination engineering, Resolution enhancement technologies

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Proceedings Article | 8 November 2005 Paper

Inverse lithography technology: verification of SRAM cell pattern

Artur Balasinski, Andrew Moore, Nader Shamma, Timothy Lin, Hee-hong Yang

Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology

KEYWORDS: Semiconductors, Lithography, Reticles, Calibration, Silicon, Scanning electron microscopy, Optical inspection, Photomasks, Optical proximity correction, Semiconducting wafers

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Proceedings Article | 22 August 2001 Paper

Method for prevention of unopened contact hole in dual-damascene process

Gyu-Ho Lyu, Chang-Hwan Kim, Suk-Joo Lee, Hee-Hong Yang, Dae-Yup Lee, Ji-Yong Yoo, Jeong-Woo Lee, Yoo-Hyon Kim, Jeong-Lim Nam, Woo-Sung Han

Proc. SPIE. 4344, Metrology, Inspection, and Process Control for Microlithography XV

KEYWORDS: Optical lithography, Deep ultraviolet, Reflection, Etching, Copper, Resistance, Photoresist materials, Critical dimension metrology, Photoresist processing, Absorption

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