HeeHong Yang
Manager of Design Integration at Headway Technologies Inc
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 1 April 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Optical proximity correction, Scanning electron microscopy, Illumination engineering, Resolution enhancement technologies, Bridges, Printing, Aberration correction, Semiconducting wafers, Algorithm development, Manufacturing

Proceedings Article | 8 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Photomasks, Lithography, Optical proximity correction, Silicon, Calibration, Scanning electron microscopy, Semiconducting wafers, Semiconductors, Optical inspection, Reticles

Proceedings Article | 22 August 2001
Proc. SPIE. 4344, Metrology, Inspection, and Process Control for Microlithography XV
KEYWORDS: Critical dimension metrology, Absorption, Photoresist materials, Deep ultraviolet, Photoresist processing, Resistance, Etching, Copper, Optical lithography, Reflection

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