HeeHong Yang
Manager of Design Integration at Headway Technologies Inc
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 1 April 2008 Paper
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Aberration correction, Manufacturing, Scanning electron microscopy, Printing, Bridges, Optical proximity correction, Algorithm development, Semiconducting wafers, Illumination engineering, Resolution enhancement technologies

Proceedings Article | 8 November 2005 Paper
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Semiconductors, Lithography, Reticles, Calibration, Silicon, Scanning electron microscopy, Optical inspection, Photomasks, Optical proximity correction, Semiconducting wafers

Proceedings Article | 22 August 2001 Paper
Proc. SPIE. 4344, Metrology, Inspection, and Process Control for Microlithography XV
KEYWORDS: Optical lithography, Deep ultraviolet, Reflection, Etching, Copper, Resistance, Photoresist materials, Critical dimension metrology, Photoresist processing, Absorption

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