Dr. Heidi B. Cao Profile

Dr. Heidi B. Cao

Senior Process Engineer at Intel Corp

SPIE Involvement:

Author

Publications (27)

Proceedings Article | 26 March 2008 Paper

Ionic photo-acid generators containing functionalized semifluorinated sulfonates for high-resolution lithography

Yi Yi, Ramakrishnan Ayothi, Christopher Ober, Wang Yueh, Heidi Cao

Proceedings Volume 6923, 69231B (2008) https://doi.org/10.1117/12.772880

KEYWORDS: Polymers, Lithography, Extreme ultraviolet lithography, Diffusion, Line edge roughness, Absorption, Extreme ultraviolet, Electron beam lithography, Transparency, Photoresist materials

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Proceedings Article | 26 March 2008 Paper

Monte Carlo simulation on line edge roughness after development in chemically amplified resist of post-optical lithography

Akinori Saeki, Takahiro Kozawa, Seiichi Tagawa, Heidi Cao, Hai Deng, Michael Leeson

Proceedings Volume 6923, 69230S (2008) https://doi.org/10.1117/12.772174

KEYWORDS: Line edge roughness, Monte Carlo methods, Diffusion, Lithography, Chemically amplified resists, Image processing, Electron beams, Extreme ultraviolet, Electron beam lithography, Extreme ultraviolet lithography

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SPIE Journal Paper | 1 October 2007

Exposure dose dependence on line edge roughness of a latent image in electron beam/extreme ultraviolet lithographies studied by Monte Carlo technique

Akinori Saeki, Takahiro Kozawa, Seiichi Tagawa, Heidi Cao, Hai Deng, Michael Leeson

JM3, Vol. 6, Issue 04, 043004, (October 2007) https://doi.org/10.1117/12.10.1117/1.2792178

KEYWORDS: Line edge roughness, Monte Carlo methods, Lithography, Molecules, Diffusion, Image enhancement, Electron beam lithography, Ionization, Electron beams, Polymers

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Proceedings Article | 12 April 2007 Paper

Effect of photo-acid generator concentration and developer strength on the patterning capabilities of a model EUV photoresist

Kwang-Woo Choi, Vivek Prabhu, Kristopher Lavery, Eric Lin, Wen-li Wu, John Woodward, Michael Leeson, Heidi Cao, Manish Chandhok, George Thompson

Proceedings Volume 6519, 651943 (2007) https://doi.org/10.1117/12.712407

KEYWORDS: Photoresist materials, Line width roughness, Extreme ultraviolet lithography, Photoresist developing, Extreme ultraviolet, Optical lithography, Scanning electron microscopy, Standards development, Systems modeling, Performance modeling

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Proceedings Article | 6 April 2007 Paper

The rational design of polymeric EUV resist materials by QSPR modelling

Kevin Jack, Heping Liu, Idriss Blakey, David Hill, Wang Yueh, Heidi Cao, Michael Leeson, Greg Denbeaux, Justin Waterman, Andrew Whittaker

Proceedings Volume 6519, 65193Z (2007) https://doi.org/10.1117/12.716213

KEYWORDS: Polymers, Extreme ultraviolet, Data modeling, Molecules, Photons, Ionization, Process modeling, Polymethylmethacrylate, Modeling, Spectroscopy

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Proceedings Article | 4 April 2007 Paper

An analysis of EUV-resist outgassing measurements

Kim Dean, Iwao Nishiyama, Hiroaki Oizumi, Anthony Keen, Heidi Cao, Wang Yueh, Takeo Watanabe, Paolo Lacovig, Luca Rumiz, Gregory Denbeaux, Julia Simon

Proceedings Volume 6519, 65191P (2007) https://doi.org/10.1117/12.712379

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Synchrotrons, Contamination, Mass spectrometry, Molecules, Mirrors, Analytical research, Calibration, EUV optics

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Proceedings Article | 15 March 2007 Paper

Phenolic molecular glasses as resists for next-generation lithography

Xavier André, Jin Kyun Lee, Anuja De Silva, Nelson Felix, Christopher Ober, Heidi Cao, Hai Deng, Hiroto Kudo, Daisuke Watanabe, Tadatomi Nishikubo

Proceedings Volume 6519, 65194B (2007) https://doi.org/10.1117/12.722919

KEYWORDS: Glasses, Lithography, Magnesium, Photoresist materials, Electron beam lithography, Deep ultraviolet, Photoresist developing, Polymers, Extreme ultraviolet, Semiconducting wafers

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Proceedings Article | 29 March 2006 Paper

All-organic non-PFOS nonionic photoacid generating compounds with functionalized fluoroorganic sulfonate motif for chemically amplified resists

Ramakrishnan Ayothi, Yi Yi, Christopher Ober, Steve Putna, Wang Yueh, Heidi Cao

Proceedings Volume 6153, 61530J (2006) https://doi.org/10.1117/12.656500

KEYWORDS: Lithography, Line edge roughness, Electron beam lithography, Chromophores, Carbon, Fluorine, Absorption, Polymers, Scanning electron microscopy, Chemically amplified resists

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Proceedings Article | 29 March 2006 Paper

Fundamentals of the reaction-diffusion process in model EUV photoresists

Kristopher Lavery, Kwang-Woo Choi, Bryan Vogt, Vivek Prabhu, Eric Lin, Wen-li Wu, Sushil Satija, Michael Leeson, Heidi Cao, George Thompson, Hai Deng, David Fryer

Proceedings Volume 6153, 615313 (2006) https://doi.org/10.1117/12.656831

KEYWORDS: Photoresist materials, Reflectivity, Interfaces, Diffusion, Polymers, Line width roughness, Process modeling, Extreme ultraviolet lithography, Extreme ultraviolet, Lithography

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Proceedings Article | 29 March 2006 Paper

Molecular glass resists for next generation lithography

Daniel Bratton, Ramakrishnan Ayothi, Nelson Felix, Heidi Cao, Hai Deng, Christopher Ober

Proceedings Volume 6153, 61531D (2006) https://doi.org/10.1117/12.656630

KEYWORDS: Glasses, Lithography, Bridges, Electron beam lithography, Extreme ultraviolet lithography, Extreme ultraviolet, Semiconducting wafers, Line edge roughness, Magnesium, FT-IR spectroscopy

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Proceedings Article | 6 May 2005 Paper

One small step: world's first integrated EUVL process line

Jeanette Roberts, Terence Bacuita, Robert Bristol, Heidi Cao, Manish Chandhok, Sang Lee, Eric Panning, Melissa Shell, Guojing Zhang, Bryan Rice

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600259

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, Semiconducting wafers, Reflectivity, Reticles, Mirrors, Light sources, Plasma, Mask making

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Proceedings Article | 4 May 2005 Paper

Inorganic polymer resists for EUVL

Juan Pablo Bravo-Vasquez, Young-Je Kwark, Christopher Ober, Heidi Cao, Hai Deng

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.600172

KEYWORDS: Silicon, Polymers, Extreme ultraviolet lithography, Extreme ultraviolet, Absorbance, Lithography, Electron beam lithography, Chlorine, Humidity, Nitrogen

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Proceedings Article | 4 May 2005 Paper

Materials for future lithography

Seung Wook Chang, Da Yang, Junyan Dai, Nelson Felix, Daniel Bratton, Kousuke Tsuchiya, Young-Je Kwark, Juan-Pablo Bravo-Vasquez, Christopher Ober, Heidi Cao, Hai Deng

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.607235

KEYWORDS: Glasses, Line edge roughness, Extreme ultraviolet lithography, Electron beam lithography, Lithography, Extreme ultraviolet, Polymers, Silicon, Chemical elements, Molecules

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Proceedings Article | 4 May 2005 Paper

Quantification of EUV resist outgassing

Wang Yueh, Heidi Cao, Vani Thirumala, Hokkin Choi

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.600540

KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Photoresist materials, Contamination, EUV optics, Nitrogen, Semiconducting wafers, Molecules, Lithography, Reflectivity

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Proceedings Article | 4 May 2005 Paper

EUV resist patterning performance from the Intel microexposure tool (MET)

Heidi Cao, Wang Yueh, Jeanette Roberts, Bryan Rice, Robert Bristol, Manish Chandhok

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.600214

KEYWORDS: Line width roughness, Extreme ultraviolet, Optical lithography, Absorbance, Scatterometry, Scanning electron microscopy, Lithography, Scatter measurement, Image resolution, Extreme ultraviolet lithography

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Proceedings Article | 24 May 2004 Paper

CD metrology for the 45-nm and 32-nm nodes

Bryan Rice, Heidi Cao, Ovijut Chaudhuri, Michael Grumski, Bruce Harteneck, Alex Liddle, Deidre Olynick, Jeanette Roberts

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.536071

KEYWORDS: Critical dimension metrology, Scanning electron microscopy, Semiconducting wafers, Metrology, Scatterometry, Silicon, Atomic force microscopy, Semiconductors, Manufacturing, Ion beams

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Proceedings Article | 20 May 2004 Paper

EUV resist imaging below 50 nm using coherent spatial filtering techniques

Michael Shumway, Eric Snow, Kenneth Goldberg, Patrick Naulleau, Heidi Cao, Manish Chandhok, James Liddle, Erik Anderson, Jeffrey Bokor

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.535666

KEYWORDS: Semiconducting wafers, Extreme ultraviolet, Gold, Photomasks, Spatial filters, Line edge roughness, Printing, Wafer-level optics, Extreme ultraviolet lithography, Spatial frequencies

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Proceedings Article | 20 May 2004 Paper

Techniques for directly measuring the absorbance of photoresists at EUV wavelengths

Manish Chandhok, Heidi Cao, Wang Yueh, Eric Gullikson, Robert Brainard, Stewart Robertson

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.535959

KEYWORDS: Absorbance, Reflectivity, Photoresist materials, Semiconducting wafers, Silicon, Extreme ultraviolet, Grazing incidence, Refraction, Extreme ultraviolet lithography, X-rays

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Proceedings Article | 14 May 2004 Paper

Patterning capabilities of EUV resists

Wang Yueh, Heidi Cao, Manish Chandhok, Sang Lee, Michael Shumway, Jeff Bokor

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.536021

KEYWORDS: Line width roughness, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Absorbance, Optical lithography, Lithography, Line edge roughness, Polymers, Manufacturing

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Proceedings Article | 14 May 2004 Paper

Characterization of outgassing for EUV technology

Vani Thirumala, Heidi Cao, Wang Yueh, Hokkin Choi, Victoria Golovkina, John Wallace, Paul Nealey, Don Thielman, Franco Cerrina

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.536052

KEYWORDS: Extreme ultraviolet lithography, Photoresist materials, Toxic industrial chemicals, Contamination, Extreme ultraviolet, Silicon, EUV optics, Lithography, Semiconducting wafers, Chemistry

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Proceedings Article | 14 May 2004 Paper

Sources of line-width roughness for EUV resists

Heidi Cao, Wang Yueh, Bryan Rice, Jeanette Roberts, Terence Bacuita, Manish Chandhok

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.536041

KEYWORDS: Line width roughness, Photoresist materials, Polymers, Diffusion, Molecules, Extreme ultraviolet, Line edge roughness, Scanning electron microscopy, Lithography, Edge roughness

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Proceedings Article | 14 May 2004 Paper

Silicon backbone polymers as EUV resists

Juan Pablo Bravo-Vasquez, Young-Je Kwark, Christopher Ober, Heidi Cao, Hai Deng, Robert Meagley

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.536438

KEYWORDS: Silicon, Polymers, Chlorine, Extreme ultraviolet, Polymerization, Lithography, Nitrogen, Absorbance, Transparency, Extreme ultraviolet lithography

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Proceedings Article | 12 June 2003 Paper

Effects of processing parameters on line-width roughtness

Bryan Rice, Heidi Cao, Manish Chandhok, Robert Meagley

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485162

KEYWORDS: Line width roughness, Line edge roughness, Photoresist processing, Semiconducting wafers, Critical dimension metrology, Silicon, Lithography, Ultrasonics, Ultrasonography, Edge roughness

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Proceedings Article | 12 June 2003 Paper

Intel's EUV resist development

Heidi Cao, Jeanette Roberts, Janel Dalin, Manish Chandhok, Robert Meagley, Eric Panning, Melissa Shell, Bryan Rice

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485095

KEYWORDS: Extreme ultraviolet, Line width roughness, Absorbance, Photoresist materials, Extreme ultraviolet lithography, Photoresist developing, Optical lithography, Lithography, Polymers, Line edge roughness

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Proceedings Article | 12 June 2003 Paper

Novel silicon-containing polymers as photoresist materials for EUV lithography

Young-Je Kwark, Juan-Pablo Bravo-Vasquez, Christopher Ober, Heidi Cao, Hai Deng, Robert Meagley

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485184

KEYWORDS: Silicon, Polymers, Polymerization, Extreme ultraviolet lithography, Extreme ultraviolet, Ruthenium, Molybdenum, Transparency, Metals, Lithography

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Proceedings Article | 24 July 2002 Paper

Collapse behavior of single layer 193- and 157-nm resists: use of surfactants in the rinse to realize the sub-130-nm nodes

Stefan Hien, Georgia Rich, Gilbert Molina, Heidi Cao, Paul Nealey

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474205

KEYWORDS: Capillaries, Frequency shift keying, Photoresist processing, Photoresist materials, Liquids, X-rays, X-ray lithography, Monochromatic aberrations, Autoregressive models, Etching

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Proceedings Article | 23 June 2000 Paper

Pattern collapse in high-aspect-ratio DUV and 193-nm resists

Wolf-Dieter Domke, Victoria Graffenberg, Shashikant Patel, Georgia Rich, Heidi Cao, Paul Nealey

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388293

KEYWORDS: Deep ultraviolet, Photoresist materials, Capillaries, Photoresist processing, Aluminum, Thin films, Photoresist developing, Bismuth, Chlorine, Silicon

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Showing 5 of 27 publications

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